AST Peva-450I Bedienungsanleitung

NANOSYSTEMFABRICATIONFACILITY(NFF),HKUST

Version1.0Pa

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Standard Operating Manual

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AST Peva-450I E-Beam Evaporation System

NANOSYSTEMFABRICATIONFACILITY(NFF),HKUST

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Contents

1. Picture and Location

2. Process Capabilities

2.1 Cleanliness Standard

2.2 Available Deposition Materials

2.3 Performance of the AST Peva-450I

3. Contact List and How to Become a Qualified User

3.1 Emergency Responses and Communications

3.2 Training to Become a Qualified AST Peva-450I User

4. Operating Procedures

4.1 System Description

4.2 Safety Warnings

4.3 Operation Rules

4.4 Initial System Checks

4.5 Status Checks

4.6 Venting the Chamber (Before Loading Wafers)

4.7 Inspecting the Chamber Before Use

4.8 Load Wafers

4.9 Pump Down

4.10 Deposition

4.11 Venting and Unloading

4.12 Pump Down and Shutdown

5. Appendix

NANOSYSTEMFABRICATIONFACILITY(NFF),HKUST

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1. Picture and Location

Granville‐PhillipsVacuum

Gauge

TouchScreenPanel

Logsheet

MAXTEKMDC‐360C

DepositionController

Telema r k XYSweep

Viewport

Main,E‐GunandHeating

Power Breakers

TT‐3High Voltage DC

Power Su



Fig 1: AST Peva-450I E-Beam Evaporation System

This tool is located at NFF Enterprise Center Cleanroom Room 4162

2. Process Capabilities

2.1 Cleanliness Standard

AST Peva-450I E-Beam Evaporation System is “Non-Standard” equipment for metal

evaporation process use.

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2.2 Available Deposition Materials

The following sources are available in AST Peva-450I E-Beam Evaporation System.

AST Peva-450I: Al, Ti, Ni and Au

NOTE: Consult a NFF EC staff member prior to do new materials other than above listed materials.

Hazardous or Radioactive materials are not allowed to be deposited in AST Peva-450I.

2.3 Performance of the AST Peva-450I E-Beam Evaporation System

What the AST Peva-450I CAN do

It can provide thin films (≤3000A thick) of various metal and semi-conductors

with precision measurement of film thickness via crystal monitoring.

It provides very directional evaporation particularly useful for lift-off metal

patterning.

It has a single vacuum chamber for METAL evaporation processes.

Deposition on up to 2” and 4” wafers at once.

Deposition on pieces, which are fixed to a 2” or 4” dummy via HB 836

Anti-static polyimide film silicone adhesive tape.

Deposition rate is fixed on 1A/s.

What the AST Peva-450I CANNOT do

Thick film deposition is not allowed because of too long processing time, wear

on the system, expense of materials, and adhesion issues with your sample.

Evaporation of dielectrics is not allowed.

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3. Contact List and How to Become a User

3.1 Emergency Responses and Communications

Security Control Center: 2358-8999 (24hr) & 2358-6565 (24hr)

Safety Officer: Mr. Wing Leong CHUNG 2358-7211 & 64406238

Deputy Safety Officer: Mr. Man Wai LEE 2358-7900 & 9621-7708

NFF EC Technician: Mr. Peter Yiu Cheong PUN 2358-7225 & 2358-7218

NFF Phase 2 Technician: Mr. Wilson Pui Keung YIP 2358-7894

3.2 Training to Become a Qualified AST Peva-450I User

Please follow the procedure below to become a qualified user of the AST Peva-450I.

1. Read all materials on the NFF website concerning the AST Peva-450I.

2. Send an e-mail to NFF requesting AST Peva-450I safety operation training.

Scheduling can take up to several weeks due to the many requests coming in

for this tool.

4. Operating Procedures

4.1 System Description

AST Peva-450I is consisted of a single vacuum chamber for METAL evaporation

processes that use an electron beam to heat the metal sources. There are 4-pocket

E-Beam evaporator used for depositing Ti, Al, Au and Ni. The materials are put into

crucible liners for better heat uniformity throughout the source material and to allow

NANOSYSTEMFABRICATIONFACILITY(NFF),HKUST

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for easy removal and refilling. Wafers are loaded on a rotating planetary and pumped

to below 1.0e-7 Torr using a cryopump. Pump down time is typically 30 minutes for

base pressure 3.0e-6 Torr. Deposition thickness is controlled via a crystal monitor.

The evaporator has three distinct sub-systems: the vacuum system, the deposition

thickness control & monitoring, and electron-gun control. AST Peva-450I has three

control consoles:

1. Master console, Touch Screen Panel – AST Peva-450I Touch Screen Panel on

the front side.

2. MAXTEK MDC-360C Deposition Controller - in the middle side, with a

backlit LCD screen.

3. TELEMARK TT-3 control - power supply (below the “MAIN PWR”,

“E-GUN PWR” and “HEATING PWR” breakers).

Fig 2: Touch Screen Panel – Menu

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NANOSYSTEMFABRICATIONFACILITY(NFF),HKUST

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Fig 3: MAXTEK MDC-360C Deposition Controller

Fig 4: TELEMARK TT-3 High Voltage DC Power Supply

4.2 Safety Warnings

This equipment can cause injury if not used in a cautious manner.

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1. The operator can inhale particles while handling the chamber and is advised to

cover the mouth or wear a protective respirator mask with fine filter.

2. The system can also be easily damaged if the electron beam is misplaced or is

allowed to drift out of position.

3. Hot targets can cause burns.

4. While the amount of X-ray escaping the machine should be safe, we do not

have current measurements of the level of exposure. Do not operate this

machine if you could be pregnant.

5. Intense light will be emitted from the evaporation materials. Always use dark

safety goggles when you look in the chamber.

4.3 Operation Rules

1. If an equipment failure while being used, never try to fix the problem by

yourself. Please contact NFF staff.

2. Do not operate equipment unless you are properly trained and approved by

NFF staff.

3. Do not leave an on-going experiment unattended.

4. Do not do the evaporation process over ten minutes per run.

5. Should be at least ten minutes for target cooling after evaporation process.

6. Do not change the e-beam focus of the system.

4.4 Initial system checks

1. Touch screen panel will show the equipment is under high vacuum mode due

to “high vacuum valve, HV” and “cryopump, CP” are ON.

2. Chamber ion gauge pressure reads less than 1.0e-7 Torr on the vacuum gauge

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controller, unless the system was recently used. (Chamber ion gauge reading is

found on the Vacuum Gauge Controller.)

3. The cryopump temperature is 12K or less.

4. The chamber temperature is 20°C or less (reading is found on touch screen

panel)

5. The crystal health is greater than 80%. (Readout on MAKTEK controller.)

4.5 Status checks

1. Check the NFF website for reservations, problems and to see if it is already

enabled by another user.

2. Check for an EMPTY sign attached to the machine. Do not use if an IN USE

sign or MAINTENANCE sign is there. Check for problem notes.

3. The system is available if the initial system and status checks are normal.

Check-in the equipment and enable the system on NFF Machine Reservation

System. Place sign “IN USE” on the machine.

4.6 Venting the chamber (before loading wafers)

1. Make sure TELEMARK TT-3 power supply main power is turned off.

2. Wait 10 minutes for cooling after evaporation process.

3. Press the “VENT” button on the touch screen panel.

4. Wait until the 307 Granville-Phillips Vacuum Gauge Controller is displayed

7.6e+2 Torr (about 4 minutes).

5. Verify the main chamber door seal has decompressed.

6. The chamber door can be opened.

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4.7 Inspecting the chamber before use

1. Inspect the planetary for any “real” wafers belonging to other users. If any are

found, keep them in a labeled box.

2. Press “SH1” button on touch screen panel for shutter open.

3. Press “POCKET” button to entry E-Gun Pocket Control page and toggle

yellow button “OFF/ON” for crucible select and verify each source is

sufficient for process.

4. During toggle “OFF/ON” button to rotate the crucible to each position and

inspect for splattering, contamination, cracking or other problems. Be sure the

crucible assembly rotates freely. Don’t use crucibles in poor condition. Report

any problems to NFF staff.

5. Inspect the chamber for peeling, particles, and material splatters. Vacuum and

wipe if necessary. Thorough cleaning of the equipment every time will aid in

reproducible results long term.

6. Make sure the view port is clear, if not; please clean it firstly before close the

chamber door.

7. Load source into the correct crucible position posted on the front of the control

panel. NOTE: some materials are allowed in multiple crucibles. Making sure

they are clean and fit with the correct height and shape (snug not tight).

Correct height would be 60% to 100% of the crucibles original Height or

original weight.

8. If more pellets are needed, be careful not to overfill. Pellets must not protrude

above crucible or Hearth may get stuck or jam.

9. Return the shutter to the closed position.

10. If a new crystal monitor is needed (80% or less), change it now.

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