AST Peva-450I Bedienungsanleitung
NANOSYSTEMFABRICATIONFACILITY(NFF),HKUST
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Standard Operating Manual
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AST Peva-450I E-Beam Evaporation System
NANOSYSTEMFABRICATIONFACILITY(NFF),HKUST
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Contents
1. Picture and Location
2. Process Capabilities
2.1 Cleanliness Standard
2.2 Available Deposition Materials
2.3 Performance of the AST Peva-450I
3. Contact List and How to Become a Qualified User
3.1 Emergency Responses and Communications
3.2 Training to Become a Qualified AST Peva-450I User
4. Operating Procedures
4.1 System Description
4.2 Safety Warnings
4.3 Operation Rules
4.4 Initial System Checks
4.5 Status Checks
4.6 Venting the Chamber (Before Loading Wafers)
4.7 Inspecting the Chamber Before Use
4.8 Load Wafers
4.9 Pump Down
4.10 Deposition
4.11 Venting and Unloading
4.12 Pump Down and Shutdown
5. Appendix
NANOSYSTEMFABRICATIONFACILITY(NFF),HKUST
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1. Picture and Location
Granville‐PhillipsVacuum
Gauge
TouchScreenPanel
Logsheet
MAXTEKMDC‐360C
DepositionController
Telema r k XYSweep
Viewport
Main,E‐GunandHeating
Power Breakers
TT‐3High Voltage DC
Power Su
pp
l
y
Fig 1: AST Peva-450I E-Beam Evaporation System
This tool is located at NFF Enterprise Center Cleanroom Room 4162
2. Process Capabilities
2.1 Cleanliness Standard
AST Peva-450I E-Beam Evaporation System is “Non-Standard” equipment for metal
evaporation process use.
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2.2 Available Deposition Materials
The following sources are available in AST Peva-450I E-Beam Evaporation System.
AST Peva-450I: Al, Ti, Ni and Au
NOTE: Consult a NFF EC staff member prior to do new materials other than above listed materials.
Hazardous or Radioactive materials are not allowed to be deposited in AST Peva-450I.
2.3 Performance of the AST Peva-450I E-Beam Evaporation System
What the AST Peva-450I CAN do
It can provide thin films (≤3000A thick) of various metal and semi-conductors
with precision measurement of film thickness via crystal monitoring.
It provides very directional evaporation particularly useful for lift-off metal
patterning.
It has a single vacuum chamber for METAL evaporation processes.
Deposition on up to 2” and 4” wafers at once.
Deposition on pieces, which are fixed to a 2” or 4” dummy via HB 836
Anti-static polyimide film silicone adhesive tape.
Deposition rate is fixed on 1A/s.
What the AST Peva-450I CANNOT do
Thick film deposition is not allowed because of too long processing time, wear
on the system, expense of materials, and adhesion issues with your sample.
Evaporation of dielectrics is not allowed.
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3. Contact List and How to Become a User
3.1 Emergency Responses and Communications
Security Control Center: 2358-8999 (24hr) & 2358-6565 (24hr)
Safety Officer: Mr. Wing Leong CHUNG 2358-7211 & 64406238
Deputy Safety Officer: Mr. Man Wai LEE 2358-7900 & 9621-7708
NFF EC Technician: Mr. Peter Yiu Cheong PUN 2358-7225 & 2358-7218
NFF Phase 2 Technician: Mr. Wilson Pui Keung YIP 2358-7894
3.2 Training to Become a Qualified AST Peva-450I User
Please follow the procedure below to become a qualified user of the AST Peva-450I.
1. Read all materials on the NFF website concerning the AST Peva-450I.
2. Send an e-mail to NFF requesting AST Peva-450I safety operation training.
Scheduling can take up to several weeks due to the many requests coming in
for this tool.
4. Operating Procedures
4.1 System Description
AST Peva-450I is consisted of a single vacuum chamber for METAL evaporation
processes that use an electron beam to heat the metal sources. There are 4-pocket
E-Beam evaporator used for depositing Ti, Al, Au and Ni. The materials are put into
crucible liners for better heat uniformity throughout the source material and to allow
NANOSYSTEMFABRICATIONFACILITY(NFF),HKUST
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for easy removal and refilling. Wafers are loaded on a rotating planetary and pumped
to below 1.0e-7 Torr using a cryopump. Pump down time is typically 30 minutes for
base pressure 3.0e-6 Torr. Deposition thickness is controlled via a crystal monitor.
The evaporator has three distinct sub-systems: the vacuum system, the deposition
thickness control & monitoring, and electron-gun control. AST Peva-450I has three
control consoles:
1. Master console, Touch Screen Panel – AST Peva-450I Touch Screen Panel on
the front side.
2. MAXTEK MDC-360C Deposition Controller - in the middle side, with a
backlit LCD screen.
3. TELEMARK TT-3 control - power supply (below the “MAIN PWR”,
“E-GUN PWR” and “HEATING PWR” breakers).
Fig 2: Touch Screen Panel – Menu
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Fig 3: MAXTEK MDC-360C Deposition Controller
Fig 4: TELEMARK TT-3 High Voltage DC Power Supply
4.2 Safety Warnings
This equipment can cause injury if not used in a cautious manner.
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1. The operator can inhale particles while handling the chamber and is advised to
cover the mouth or wear a protective respirator mask with fine filter.
2. The system can also be easily damaged if the electron beam is misplaced or is
allowed to drift out of position.
3. Hot targets can cause burns.
4. While the amount of X-ray escaping the machine should be safe, we do not
have current measurements of the level of exposure. Do not operate this
machine if you could be pregnant.
5. Intense light will be emitted from the evaporation materials. Always use dark
safety goggles when you look in the chamber.
4.3 Operation Rules
1. If an equipment failure while being used, never try to fix the problem by
yourself. Please contact NFF staff.
2. Do not operate equipment unless you are properly trained and approved by
NFF staff.
3. Do not leave an on-going experiment unattended.
4. Do not do the evaporation process over ten minutes per run.
5. Should be at least ten minutes for target cooling after evaporation process.
6. Do not change the e-beam focus of the system.
4.4 Initial system checks
1. Touch screen panel will show the equipment is under high vacuum mode due
to “high vacuum valve, HV” and “cryopump, CP” are ON.
2. Chamber ion gauge pressure reads less than 1.0e-7 Torr on the vacuum gauge
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controller, unless the system was recently used. (Chamber ion gauge reading is
found on the Vacuum Gauge Controller.)
3. The cryopump temperature is 12K or less.
4. The chamber temperature is 20°C or less (reading is found on touch screen
panel)
5. The crystal health is greater than 80%. (Readout on MAKTEK controller.)
4.5 Status checks
1. Check the NFF website for reservations, problems and to see if it is already
enabled by another user.
2. Check for an EMPTY sign attached to the machine. Do not use if an IN USE
sign or MAINTENANCE sign is there. Check for problem notes.
3. The system is available if the initial system and status checks are normal.
Check-in the equipment and enable the system on NFF Machine Reservation
System. Place sign “IN USE” on the machine.
4.6 Venting the chamber (before loading wafers)
1. Make sure TELEMARK TT-3 power supply main power is turned off.
2. Wait 10 minutes for cooling after evaporation process.
3. Press the “VENT” button on the touch screen panel.
4. Wait until the 307 Granville-Phillips Vacuum Gauge Controller is displayed
7.6e+2 Torr (about 4 minutes).
5. Verify the main chamber door seal has decompressed.
6. The chamber door can be opened.
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4.7 Inspecting the chamber before use
1. Inspect the planetary for any “real” wafers belonging to other users. If any are
found, keep them in a labeled box.
2. Press “SH1” button on touch screen panel for shutter open.
3. Press “POCKET” button to entry E-Gun Pocket Control page and toggle
yellow button “OFF/ON” for crucible select and verify each source is
sufficient for process.
4. During toggle “OFF/ON” button to rotate the crucible to each position and
inspect for splattering, contamination, cracking or other problems. Be sure the
crucible assembly rotates freely. Don’t use crucibles in poor condition. Report
any problems to NFF staff.
5. Inspect the chamber for peeling, particles, and material splatters. Vacuum and
wipe if necessary. Thorough cleaning of the equipment every time will aid in
reproducible results long term.
6. Make sure the view port is clear, if not; please clean it firstly before close the
chamber door.
7. Load source into the correct crucible position posted on the front of the control
panel. NOTE: some materials are allowed in multiple crucibles. Making sure
they are clean and fit with the correct height and shape (snug not tight).
Correct height would be 60% to 100% of the crucibles original Height or
original weight.
8. If more pellets are needed, be careful not to overfill. Pellets must not protrude
above crucible or Hearth may get stuck or jam.
9. Return the shutter to the closed position.
10. If a new crystal monitor is needed (80% or less), change it now.
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